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dc.contributor.authorNegi, D. S.
dc.contributor.authorRoy, A.
dc.contributor.authorLoukya, B.
dc.contributor.authorDileep, K.
dc.contributor.authorShetty, S.
dc.contributor.authorKumar, N.
dc.contributor.authorKumar, P. S. Anil
dc.contributor.authorDatta, Ranjan
dc.date.accessioned2017-02-21T07:09:03Z-
dc.date.available2017-02-21T07:09:03Z-
dc.date.issued2014
dc.identifier.citationNegi, DS; Roy, A; Loukya, B; Dileep, K; Shetty, S; Kumar, N; Kumar, PSA; Datta, R, Epitaxial Co metal thin film grown by pulsed laser deposition using oxide target. Journal of Crystal Growth 2014, 394, 112-115, http://dx.doi.org/10.1016/j.jcrysgro.2014.02.033en_US
dc.identifier.citationJournal of Crystal Growthen_US
dc.identifier.citation394en_US
dc.identifier.issn0022-0248
dc.identifier.urihttp://hdl.handle.net/10572/2463-
dc.descriptionRestricted Accessen_US
dc.description.abstractWe report here the growth of epitaxial Co metal thin film on c-plane sapphire by pulsed laser deposition (RD) using Co:ZnO target utilizing the composition inhomogeneity of the corresponding plasma. Two distinct plasma composition regions have been observed using heavily alloyed Co0.6Zn0.4O target. The central and intense region of the plasma grows Co:ZnO film; the extreme tail grows only Co metal with no trace of either ZnO or Co oxide In between the two extremes, mixed phases (Co +Co-oxides +Co:ZnO) were observed. The Co metal thin film grown in this way shows room temperature ferromagnetism with large in plane magnetization similar to 1288 emu cm(-3) and a coerciviLy of similar to 230 Oe with applied field parallel to the film-substrate interface. Carrier density of the film is similar to 10(22) cm(-3). The film is epiLaxial single phase Co metal which is confirmed by both X-ray diffraction and transmission electron microscopy characierizaLions. Planar Hall Effect (PHE) and Magneto Optic Kerr Effect (MOKE) measurements confirm that the film possesses similar attributes of Co metal. The result shows that the epiLaxial Co metal thin film can be grown from its oxides in the PLD. (C) 2014 Elsevier B.V. All rights reserved.en_US
dc.description.uri1873-5002en_US
dc.description.urihttp://dx.doi.org/10.1016/j.jcrysgro.2014.02.033en_US
dc.language.isoEnglishen_US
dc.publisherElsevier Science Bven_US
dc.rights@Elsevier Science Bv, 2014en_US
dc.subjectCrystallographyen_US
dc.subjectMaterials Scienceen_US
dc.subjectApplied Physicsen_US
dc.subjectLaser Epitaxyen_US
dc.subjectMetalsen_US
dc.subjectOxidesen_US
dc.subjectMagnetic Materialsen_US
dc.subjectMagnetic Semiconductorsen_US
dc.subjectQualityen_US
dc.titleEpitaxial Co metal thin film grown by pulsed laser deposition using oxide targeten_US
dc.typeArticleen_US
Appears in Collections:Research Articles (Ranjan Datta)

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