Please use this identifier to cite or link to this item: http://lib.jncasr.ac.in:8080/jspui/handle/10572/1888
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dc.contributor.authorGupta, Ritu
dc.contributor.authorSiddhanta, Soumik
dc.contributor.authorMettela, Gangaiah
dc.contributor.authorChakraborty, Swati
dc.contributor.authorNarayana, Chandrabhas
dc.contributor.authorKulkarni, G. U.
dc.date.accessioned2016-10-28T05:58:24Z-
dc.date.available2016-10-28T05:58:24Z-
dc.date.issued2015
dc.identifier.citationRSC Advancesen_US
dc.identifier.citation5en_US
dc.identifier.citation103en_US
dc.identifier.citationGupta, R.; Siddhanta, S.; Mettela, G.; Chakraborty, S.; Narayana, C.; Kulkarni, G. U., Solution processed nanomanufacturing of SERS substrates with random Ag nanoholes exhibiting uniformly high enhancement factors. RSC Advances 2015, 5 (103), 85019-85027.en_US
dc.identifier.issn2046-2069
dc.identifier.urihttp://hdl.handle.net/10572/1888-
dc.descriptionRestricted accessen_US
dc.description.abstractAchieving high Raman enhancement (SERS) that is relatively uniform over a large substrate area has been a major challenge in nanomanufacturing, as enhancement is localized around a plasmonic hotspot and hotspots are not usually spread uniformly over a substrate. Herein, we demonstrate a single-step, scalable method for the fabrication of Ag nanohole-based SERS substrates exhibiting similar to 10(8) enhancement factors. The SERS enhancement of these substrates could be further augmented by approximately 4 times through interference effects involving an underlying SiO2 spacer of controlled thickness on the Si substrate, in agreement with FDTD simulations. Electrical activation by applying a short DC pulse across the Ag film and Si substrate resulted in similar to 12% additional increase in the enhancement factor, while importantly the standard deviation of the signal across the 1 cm(2) substrate decreased from 9.5% to 3.1%. Both these effects could be attributed to electromigration of the metal producing protrusions on the nanoparticle surfaces thus populating with the hotspots for high performance SERS. These relatively uniform and reproducible SERS-chips with high enhancement factors can potentially be used as highly sensitive multi-functional platforms for point-of-care diagnostics.en_US
dc.description.urihttp://dx.doi.org/10.1039/c5ra17119aen_US
dc.language.isoEnglishen_US
dc.publisherRoyal Society of Chemistryen_US
dc.rights?Royal Society of Chemistry, 2015en_US
dc.subjectChemistryen_US
dc.subjectSubwavelength Hole Arraysen_US
dc.subjectRaman-Scattering Sersen_US
dc.subjectOptical-Propertiesen_US
dc.subjectLarge-Areaen_US
dc.subjectGold Nanoholeen_US
dc.subjectSurfaceen_US
dc.subjectSpectroscopyen_US
dc.subjectSilveren_US
dc.subjectPlasmonen_US
dc.subjectResonanceen_US
dc.titleSolution processed nanomanufacturing of SERS substrates with random Ag nanoholes exhibiting uniformly high enhancement factorsen_US
dc.typeArticleen_US
Appears in Collections:Research Articles (Kulkarni, G. U.)

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