Please use this identifier to cite or link to this item: http://lib.jncasr.ac.in:8080/jspui/handle/10572/1887
Title: Site selective Cu deposition on Au microcrystallites: corners, edges versus planar surfaces
Authors: Mettela, Gangaiah
Kulkarni, G. U.
Keywords: Chemistry
Crystallography
Core-Shell Nanoparticles
Epitaxial-Growth
Underpotential Deposition
Copper Deposition
Reduction Method
Nanocrystals
Pd
Nanocubes
Diffraction
Reactivity
Issue Date: 2015
Publisher: Royal Society of Chemistry
Citation: Crystengcomm
17
48
Mettela, G.; Kulkarni, G. U., Site selective Cu deposition on Au microcrystallites: corners, edges versus planar surfaces. Crystengcomm 2015, 17 (48), 9459-9465.
Abstract: Among epitaxially grown metal over metal systems, Cu on a Au surface forms a notable exception given the large lattice mismatch (similar to 11.2%). Although widely observed, Cu growth on Au is less understood at both nano and bulk length scales. In this work, we have relied on Au microcrystallites which provide adequate platform to access both the length scales and thus have examined Cu electroless deposition using electron microscopy techniques, on planar as well as corner and edge regions distinctly. Amazingly, the growth at different regions was found to be highly varied; the corners were found to be most active, followed by edges and planar regions. Interestingly, the sharper the corner, the higher the Cu deposition is. Importantly, both Au{111} and Au{100} facets could be explored simultaneously, using a routine electron microscope.
Description: Restricted access
URI: http://hdl.handle.net/10572/1887
ISSN: 1466-8033
Appears in Collections:Research Articles (Kulkarni, G. U.)

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